Abstract

The simultaneous exposure and development (SED) process for a positive photoresist, when exposed to a uniform incident flux and to a real image with a nonuniform transverse intensity distribution, is mathematically simulated. The calculation is done for photoresist on optically matched and unmatched substrates while varying the incident radiation intensity, the initial resist thickness, and developer concentration. The results of the calculation and several experiments with SED produced gratings suggest that SED will yield higher contrast than the usual expose-and-then-develop (E-D) process. Furthermore, the standing wave effect in the photoresist films coated on reflective substrates is minimized and decreases with depth into the films when the SED process is used.

© 1977 Optical Society of America

Full Article  |  PDF Article
OSA Recommended Articles
Simultaneous exposure and development of photoresist materials: an analytical model

P. Agmon, A. C. Livanos, A. Katzir, and A. Yariv
Appl. Opt. 16(10) 2612-2614 (1977)

Developed profile of holographically exposed photoresist gratings

Bernardo de A. Mello, Ivan F. da Costa, Carlos R. A. Lima, and Lucila Cescato
Appl. Opt. 34(4) 597-603 (1995)

Applying an interferometric exposure model to analyze the influences of process parameters on the linewidth

Cheng-Wei Chien, Jyh-Chen Chen, and Ju-Yi Lee
Appl. Opt. 45(32) 8278-8287 (2006)

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Figures (25)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Tables (1)

You do not have subscription access to this journal. Article tables are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Equations (22)

You do not have subscription access to this journal. Equations are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Metrics

You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription