Abstract

A method for determining the refractive index profile of thick phase gratings in linear electrooptic crystals is presented. This method also determines the effective photovoltaic electric field and the relative contributions of diffusion and drift during hologram recording. The method requires only a knowledge of the modulation ratio during hologram recording and the fundamental and the higher-order diffraction efficiencies of the grating. As an illustration of the method, the refractive index profile, the effective photovoltaic field, and the relative contributions of diffusion and drift are determined from experimental measurements for a lithium niobate holographic grating.

© 1976 Optical Society of America

Dynamically produced refractive-index variations with thickness of volume holograms in electrooptic crystals

R. Magnusson and T. K. Gaylord
Appl. Opt. 15(12) 3021-3024 (1976)

Holographic storage and photoconductivity in PLZT ceramic materials

J. W. Burgess, R. J. Hurditch, C. J. Kirkby, and G. E. Scrivener
Appl. Opt. 15(6) 1550-1557 (1976)

Optical waveguide refractive index profiles determined from measurement of mode indices: a simple analysis

J. M. White and P. F. Heidrich
Appl. Opt. 15(1) 151-155 (1976)

Electrooptic Bragg-deflection modulators: theoretical and experimental studies

Yong-Kyung Lee and Shyh Wang
Appl. Opt. 15(6) 1565-1572 (1976)

Refractive-index profile of an optical fiber: its measurement by the scattering-pattern method

T. Okoshi and K. Hotate
Appl. Opt. 15(11) 2756-2764 (1976)