Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Application of Spatial Filtering Subtraction to Thin Film and Integrated Circuit Mask Inspection

Not Accessible

Your library or personal account may give you access

Abstract

Studies have been performed to investigate the application of spatial filtering subtraction to mask inspection. By using a grating at the spatial frequency plane, images can be subtracted to give a display of errors on a black background. Results indicate that this technique could have application for integrated circuit and thin film mask inspection provided there are two or more repeated patterns on the mask.

© 1973 Optical Society of America

Full Article  |  PDF Article
More Like This
Subtractive Method of Optical Thin-Film Interference Filter Design

J. A. Dobrowolski
Appl. Opt. 12(8) 1885-1893 (1973)

Additive and Subtractive Microwave Holography

L. G. Gregoris and K. lizuka
Appl. Opt. 12(11) 2641-2648 (1973)

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Figures (10)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Equations (13)

You do not have subscription access to this journal. Equations are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved