Abstract

We have evaluated chemical vapor-deposited silicon oxynitride films on fused silica as a potential integrated optics medium. Refractive index of these glassy films depends on composition, which is adjusted by controlling the ratio of the nitric oxide and silane reactants. Films of n = 1.48–1.54 had losses <0.4 dB/cm at 633 nm. The preparation of the fused silica substrate surface and other precautions to minimize scattering centers are discussed.

© 1972 Optical Society of America

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