Abstract

Defect enhancement in semiconductor wafers is shown to be possible by spatial frequency filtering without the necessity for filter alignment. The technique depends on the wafer being sufficiently periodic. Coherent optical and digital computer simulation results are presented.

© 1971 Optical Society of America

Synthesis of a Spatial Filter for the Combined Operations of Subtraction and Correlation

S. K. Yao and S. H. Lee
Appl. Opt. 10(5) 1154-1156 (1971)

Four-dimensional microscopy of defects in integrated circuits

Jelda Jayne Miranda and Caesar Saloma
Appl. Opt. 42(32) 6520-6524 (2003)

Comments on Filtering of Defects in Integrated Circuits

G. Winzer, N. Douklias, and H.-P. Kraft
Appl. Opt. 11(5) 1269-1269 (1972)

Experimental Demonstration of Optical Sectioning by Spatial Filtering and Its Possible Use in Transmission of Three-Dimensional Pictures

H. J. Gerritsen and B. Horwitz
Appl. Opt. 10(4) 862-867 (1971)

Optical Filter Analysis as a Function of Nonoptimum Noise Conditions

J. E. Wasielewski
Appl. Opt. 10(11) 2439-2441 (1971)