Chemical Vapour Deposition and Atomic Layer Deposition: Metals for Optical Fibres

S. T. Barry; M. B. E. Griffiths; D. J. Mandia; J. P. Coyle; P. G. Gordon; W. Zhou; L. Shao; J. Albert

doi:10.1364/WSOF.2013.W4.3

Workshop on Specialty Optical Fibers and their Applications
(Optica Publishing Group, 2013),
paper W4.3
•https://doi.org/10.1364/WSOF.2013.W4.3

Chemical Vapour Deposition and Atomic Layer Deposition: Metals for Optical Fibres

S. T. Barry, M. B. E. Griffiths, D. J. Mandia, J. P. Coyle, P. G. Gordon, W. Zhou, L. Shao, and J. Albert

Workshop on Specialty Optical Fibers and their Applications 2013

Sigtuna Sweden
28–30 August 2013
ISBN: 978-1-55752-984-8

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Fiber Processing (W4)

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S. T. Barry, M. B. E. Griffiths, D. J. Mandia, J. P. Coyle, P. G. Gordon, W. Zhou, L. Shao, and J. Albert, "Chemical Vapour Deposition and Atomic Layer Deposition: Metals for Optical Fibres," in Workshop on Specialty Optical Fibers and their Applications, (Optica Publishing Group, 2013), paper W4.3.

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Abstract

Chemical vapour deposition (CVD) and atomic layer deposition (ALD) are closely-related techniques for the fabrication of thin films on a variety of substrates. Both of these methods are mature, and have been heavily employed for the deposition of metal, semiconducting, and dielectric films in a wide diversity of industries. Specifically, microelectronics and photovoltaics employ these methods for device fabrication.

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