Abstract
Rapid progress in the speed of semiconductor devices and integrated circuits has been creating a great need for new testing tools which have a capability of subpicosecond temporal resolution. Since early 1980s, ultrafast lasers and optoelectronic technologies have spawned a variety of novel measurement techniques whose bandwidth approaches the terahertz regime. One of the most promising optical techniques to meet this demand is electro-optic sampling (EOS) [1]-[4]. In the past 10 years, the EOS technique has become a laboratory standard. It will now move from in-house technique to widespread engineering use. In this paper, we review recent developments in electro-optic measurement techniques for characterization and diagnosis of ultrafast electronic and photonic devices and report application results.
© 1995 Optical Society of America
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