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  • Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies
  • OSA Technical Digest (CD) (Optica Publishing Group, 2007),
  • paper JThD57

Lithography, Plasmonics and Sub-wavelength Aperture Exposure Technology

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Abstract

We report enhanced transmission of 250 nm radiation by sub-wavelength square aperture arrays on silver and demonstrate its use in optical lithography with far-reduced number of addressed pixels to produce very good edge acuity.

© 2007 Optical Society of America

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