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Optica Publishing Group
  • Quantum Electronics and Laser Science Conference
  • OSA Technical Digest (Optica Publishing Group, 1992),
  • paper QMA3

Demonstration of submicron direct-write optical lithography with cold atoms

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Abstract

It has recently been demonstrated that light pressure force can create a desired pattern on a substrate by manipulating an atomic beam while the atoms are being deposited onto the substrate surface.1 It has long been known that the dipole force due to the interaction between a two-level atom and a standing-wave optical field can channel atoms into the intensity minima or maxima of a standing-wave optical field.2–5 We have demonstrated that these two techniques can be combined to create sodium gratings on a silicon surface, where the gratings have the period of half the wavelength of the standing-wave field, or approximately 3000 Å for the 32S1/2 → 32P3/2 transition in sodium.

© 1992 Optical Society of America

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