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Optica Publishing Group
  • Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies
  • OSA Technical Digest (CD) (Optica Publishing Group, 2007),
  • paper PThB4
  • https://doi.org/10.1364/PHAST.2007.PThB4

High Power Lasers for Generation of EUV Light

Open Access Open Access

Abstract

High power lasers (1-10 ns pulse width, 10-20 kW) are needed for laser-produced plasma (LPP)-based EUV sources to support extreme ultraviolet (EUV) lithography. The requirements and status of high power laser technology will be reviewed.

© 2007 Optical Society of America


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