Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
  • OSA Advanced Photonics Congress (AP) 2020 (IPR, NP, NOMA, Networks, PVLED, PSC, SPPCom, SOF)
  • OSA Technical Digest (Optica Publishing Group, 2020),
  • paper JTu4C.3
  • https://doi.org/10.1364/NOMA.2020.JTu4C.3

Investigation of Optoelectronic and Band-gap of Niobium Doped Titanium Dioxide Film Deposited by Electron-beam Evaporation with Ion-beam Assisted

Not Accessible

Your library or personal account may give you access

Abstract

This research investigated the optoelectronic and band-gap of Nb doped TiO2 film deposited by electron-beam evaporation with ion-beam assisted. TiO2 mixed with Nb2O5 were prepared to two types of powder and pellets for evaporated material.

© 2020 The Author(s)

PDF Article
More Like This
Reactive evaporation and ion-assisted deposition of hafium dioxide thin films

J. P. Lehan, C. K. Hwangbo, B. G. Bovard, Y. Mao, and H. Angus Macleod
TUH4 OSA Annual Meeting (FIO) 1989

Inhomogeneity control for titanium dioxide films by ion assisted deposition method

Itaru Takagi and Shigetaro Ogura
TuA3 Optical Interference Coatings (OIC) 1995

Observations of morphology for homogeneous and inhomogeneous titanium dioxide films deposited by ion assisted deposition method

Shigetaro Ogura, Itaru Takagi, and Kazuo Kikuchi
ThB10 Optical Interference Coatings (OIC) 1995

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved