Abstract

We report on geometry control of Si-based photonic nanostructures coupled with quantum dot multilayers and its application to solar cells. Our fabrication method consists of self-organized growth of vertically aligned Ge quantum dot multilayers and subsequent maskless wet etching without any lithography to realize macroscopically uniform wafer-scale nanostructures, which are suitable for solar cell applications. Geometry of the photonic nanostructures could be widely changed by various routes such as structural parameters of the quantum dot multilayers, choice of the growth temperature, etching duration, and so on. Integration of the photonic nanostructures in crystalline Si solar cells was found to enhance near-infrared optical absorption, which would improve the conversion efficiency of the solar cell.

© 2014 Optical Society of America

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