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Optical limiter for DF Laser based on deep-etched fused- silica grating

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Abstract

Based on the deep-etched fused-silica grating, an optical limiter for deuterium fluoride (DF) laser is designed. The grating’s parameters are optimized by rigorous coupled wave analysis (RCWA), and the structure can be fabricated with recent CMOS technology. The optical limiter has good performance with incident angle between 40º and 50º, which is simulated by FDTD under weak light and strong light, respectively. The result shows that the weak incident light almost propagates in the line and the strong incident light changes the propagation direction at right angle through the optical limiter.

© 2015 Optical Society of America

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