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Photorefractive Lithography in Poly(Methyl Methacrylate) (PMMA)

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Abstract

Synchrotron light changes the refractive index of poly(methyl methacrylate) (PMMA). Refractive-index enhancements as well as reductions depending on dose and energy of the radiation used can be observed. This effect is capable for manufacturing of diffractive-optical components as it is successfully demonstrated by realization of waveguides in PMMA.

© 2003 Optical Society of America

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