Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > OIC > 2019 > WD > WD.4

Improvement of uniformities of thickness and incident angles of particles by swinging rotation motion on reactive sputtering deposition

Masahiro Akiba

Not Accessible

Your library or personal account may give you access

Abstract

On reactive magnetron sputtering, we developed swinging rotation motion. It improves uniformities of thickness and incident angles of particles. The uniformities and the area size are easily adjustable with the range of the swinging motion.

© 2019 The Author(s)

PDF Article
More Like This
Modelling and validation of a large area thin film uniform deposition on a rotating drum Using Microwave Reactive Sputtering

Cheng Li, Shigeng Song, Ewan Waddell, David Child, and Des Gibson
WA.10 Optical Interference Coatings (OIC) 2016

Rotating Target Source: Novel Shaperless Concept for Magnetron Sputtering with Excellent Uniformity

M. Chesaux, S. Schwyn Thöny, S. Gees, and A. Frigg
WA.2 Optical Interference Coatings (OIC) 2016

Stationary and In-line Reactive Magnetron Sputter Technologies for Deposition of Optical Coatings

Peter Frach, Hagen Bartzsch, Joern Weber, Joern-Steffen Liebig, and Volker Kirchhoff
MA6 Optical Interference Coatings (OIC) 2007

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use