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The stress and microstructure of reactively sputtered Ni/Ti multilayers with different d-spacing

Yufei Feng, Runze Qi, Zhong Zhang, Qiushi Huang, and Zhanshan Wang

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Abstract

The stress and microstructure of reactively sputtered Ni/Ti multilayers with different bilayer is investigated for applications in neutron optical devices. The microstructure of multilayers has been characterized by GIXR, XRD and XPS measurements.

© 2019 The Author(s)

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