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Conferences > OIC > 2016 > WE > WE.4

Investigation of stress mechanism of SiO2 and Nb2O5 thin films sputtered on flexible substrate with finite element method

Hsi-Chao Chen, Chen-Yu Huang, and Po-Wei Cheng

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Abstract

The stress mechanism of SiO2 and Nb2O5 were sputtering on BK7 and PET, PC flexible substrates were investigated by FEM. The intrinsic stress was simulated by fitting ERT technique could reduce the error to 1%.

© 2016 Optical Society of America

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