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Durable AlN and Al2O3 Optical Films Deposited by Low Duty Cycle Pulsed Magnetron Sputtering

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Abstract

We applied low-duty cycle pulsed magnetron reactive sputtering of an Al target to achieve stable deposition of transparent Al2O3 films and AlN films with high density, high hardness, and low stress at deposition rates of ~60 nm/min.

© 2016 Optical Society of America

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