Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > OIC > 2016 > WA > WA.5

Plasma Assisted Reactive Magnetron Sputtered Silicon Films with Tailored Optical Properties

Harro Hagedorn, Detlef Arhilger, Jürgen Pistner, and Holger Reus

Not Accessible

Your library or personal account may give you access

Abstract

Silicon layers with low extinction coefficient and moderate compressive stress were deposited by plasma assisted reactive magnetron sputtering. In combination with silica, high a transmittance band pass filter with low angle shift for wavelength below 1000nm was produced.

© 2016 Optical Society of America

PDF Article
More Like This
Low loss, plasma beam assisted reactive magnetron sputtered silicon nitride films for optical applications

Andreas Frigg, Andreas Boes, Guanghui Ren, Duk-Yong Choi, Silvio Gees, and Arnan Mitchell
WB.4 Optical Interference Coatings (OIC) 2019

Optical, Structural and Mechanical Properties of Silicon-Oxynitride Films Prepared by Pulsed Magnetron Sputtering

Chien-Jen Tang, Cheng-Chung Jaing, Chuen-Lin Tien, Wei-Chiang Sun, and Shih-Chin Lin
ThD.4 Optical Interference Coatings (OIC) 2016

UV- and VIS Filter Coatings by Plasma Assisted Reactive Magnetron Sputtering (PARMS)

M. Scherer, J. Pistner, and W. Lehnert
MA7 Optical Interference Coatings (OIC) 2010

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use