Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > OIC > 2016 > WA > WA.2

Rotating Target Source: Novel Shaperless Concept for Magnetron Sputtering with Excellent Uniformity

M. Chesaux, S. Schwyn Thöny, S. Gees, and A. Frigg

Not Accessible

Your library or personal account may give you access

Abstract

In this novel approach the distribution of the sputtered flux is tailored by careful adjustment of the shape of the race track and of the magnetic field intensity. Target usage is improved by rotating the disk shaped target. Uniformities <±0.25% over 200 mm wafer with 6 mm edge exclusion can be reached.

© 2016 Optical Society of America

PDF Article
More Like This
Innovative Sputter System for High Volume Production of Demanding Optical Interference Coatings

S. Schwyn Thöny, M. Chesaux, S. Gees, and A. Frigg
WA.7 Optical Interference Coatings (OIC) 2016

Modelling and validation of a large area thin film uniform deposition on a rotating drum Using Microwave Reactive Sputtering

Cheng Li, Shigeng Song, Ewan Waddell, David Child, and Des Gibson
WA.10 Optical Interference Coatings (OIC) 2016

Plasma Assisted Pulsed Magnetron Sputtering (PAPMS) of Aluminum Oxide

Tolga Erguder and Ralph Faber
WB.11 Optical Interference Coatings (OIC) 2016

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use