Design and fabrication: a band-pass filter with 0.2 nm bandwidth at 1064 nm wavelength

Dingquan Liu; Dingquan Liu; Kaixuan Wang; Kaixuan Wang; Chang Chen; Chong Ma

doi:10.1364/OIC.2016.TC.8

Optical Interference Coatings 2016
OSA Technical Digest (online) (Optica Publishing Group, 2016),
paper TC.8
•https://doi.org/10.1364/OIC.2016.TC.8

Design and fabrication: a band-pass filter with 0.2 nm bandwidth at 1064 nm wavelength

Dingquan Liu, Kaixuan Wang, Chang Chen, and Chong Ma

Optical Interference Coatings 2016

Tucson, Arizona United States
19–24 June 2016
ISBN: 978-1-943580-13-2

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OIC 2016 Design Problem Results and Coating Designs (TC)

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D. Liu, K. Wang, C. Chen, and C. Ma, "Design and fabrication: a band-pass filter with 0.2 nm bandwidth at 1064 nm wavelength," in Optical Interference Coatings 2016, OSA Technical Digest (online) (Optica Publishing Group, 2016), paper TC.8.

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Abstract

A band-pass filter with 0.2 nm bandwidth has been designed and fabricated by dual-ion-beam sputtering for distance measurement with 1064 nm wavelength laser. The peak transmission reaches 69% and the spectral shift no more than 0.02 nm.

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