Production of Lanthanum Titanium Oxide Optical Thin Films by Sputtering Method

Tomoaki Takahashi; Hiroshi Murotani

doi:10.1364/OIC.2013.WA.11

Optical Interference Coatings
OSA Technical Digest (online) (Optica Publishing Group, 2013),
paper WA.11
•https://doi.org/10.1364/OIC.2013.WA.11

Production of Lanthanum Titanium Oxide Optical Thin Films by Sputtering Method

Tomoaki Takahashi and Hiroshi Murotani

Optical Interference Coatings 2013

Whistler Canada
16–21 June 2013
ISBN: 978-1-55752-970-1

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T. Takahashi and H. Murotani, "Production of Lanthanum Titanium Oxide Optical Thin Films by Sputtering Method," in Optical Interference Coatings, M. Tilsch and D. Ristau, eds., OSA Technical Digest (online) (Optica Publishing Group, 2013), paper WA.11.

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Abstract

The purpose of research is to examine the possibility of lanthanum titanium oxide coating with sputtering. The evaporation material lanthanum titanium oxide showed that it could be used as optical thin films with sputtering equipment by optimizing coating condition.

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