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Conferences > OIC > 2013 > ThB > ThB.3

Correlation between properties of HfO2 films and preparing parameters by ion beam Sputtering deposition

Huasong Liu, Yugang Jiang, Lishuan Wang, Jiang Leng, Peng Sun, Kewen Zhuang, Junhong Yu, Yiqin Ji, Xinbin Cheng, Hongfei Jiao, Zhanshan Wang, and Bingjun Wu

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Abstract

Effects of preparing parameters on properties of HfO2 films was systematically researched by orthogonal experiment method and the results can be helped to select optimal preparing parameters for different application requirements.

© 2013 Optical Society of America

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