Deposition of Stable Thin Film Materials Commonly used in the Infrared by Low-pressure Ion Assisted Deposition

Wayne G Sainty

doi:10.1364/OIC.2013.PTE.2

Optical Interference Coatings Postdeadline
OSA Technical Digest (online) (Optica Publishing Group, 2013),
paper PTE.2
•https://doi.org/10.1364/OIC.2013.PTE.2

Deposition of Stable Thin Film Materials Commonly used in the Infrared by Low-pressure Ion Assisted Deposition

Wayne G Sainty

Optical Interference Coatings 2013

Whistler Canada
16–21 June 2013
ISBN: 978-1-55752-974-9

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W. G. Sainty, "Deposition of Stable Thin Film Materials Commonly used in the Infrared by Low-pressure Ion Assisted Deposition," in Optical Interference Coatings Postdeadline, M. Tilsch and D. Ristau, eds., OSA Technical Digest (online) (Optica Publishing Group, 2013), paper PTE.2.

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Abstract

This initial study investigates the influence of Low-pressure IAD on the optical and physical properties of metal-fluorides commonly used in the production of multilayer stacks

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