Nodular defect planarization for improved multilayer mirror laser resistance

Christopher J. Stolz; Justin E. Wolfe; Paul B. Mirkarimi; James A. Folta; John J. Adams; Marlon G. Menor; Nick E. Teslich; Regina Soufli; Carmen Menoni; Dinesh Patel

doi:10.1364/OIC.2013.FA.1

Optical Interference Coatings
OSA Technical Digest (online) (Optica Publishing Group, 2013),
paper FA.1
•https://doi.org/10.1364/OIC.2013.FA.1

Nodular defect planarization for improved multilayer mirror laser resistance

Christopher J. Stolz, Justin E. Wolfe, Paul B. Mirkarimi, James A. Folta, John J. Adams, Marlon G. Menor, Nick E. Teslich, Regina Soufli, Carmen Menoni, and Dinesh Patel

Optical Interference Coatings 2013

Whistler Canada
16–21 June 2013
ISBN: 978-1-55752-970-1

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LIDT I: Defects and Materials (FA)

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C. J. Stolz, J. E. Wolfe, P. B. Mirkarimi, J. A. Folta, J. J. Adams, M. G. Menor, N. E. Teslich, R. Soufli, C. Menoni, and D. Patel, "Nodular defect planarization for improved multilayer mirror laser resistance," in Optical Interference Coatings, M. Tilsch and D. Ristau, eds., OSA Technical Digest (online) (Optica Publishing Group, 2013), paper FA.1.

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Abstract

Planarizing nodular defects with angle-dependent ion etching and uniform deposition increased the 1064 nm laser resistance of optical interference mirror coatings by greater than 20×.

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