Study on the measurement and mechanism of stress in SiO2 thin films

Tao Ding; Xiaowen Ye; Yongli Liu; Hongfei Jiao; Jinlong Zhang; Xinbin Cheng; Zhanshan Wang

doi:10.1364/OIC.2010.WD12

Optical Interference Coatings
OSA Technical Digest (Optica Publishing Group, 2010),
paper WD12
•https://doi.org/10.1364/OIC.2010.WD12

Study on the measurement and mechanism of stress in SiO₂ thin films

Tao Ding, Xiaowen Ye, Yongli Liu, Hongfei Jiao, Jinlong Zhang, Xinbin Cheng, and Zhanshan Wang

Optical Interference Coatings 2010

Tucson, Arizona United States
6–11 June 2010
ISBN: 978-1-55752-891-9

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Coating Stress (WD)

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T. Ding, X. Ye, Y. Liu, H. Jiao, J. Zhang, X. Cheng, and Z. Wang, "Study on the measurement and mechanism of stress in SiO2 thin films," in Optical Interference Coatings, OSA Technical Digest (Optica Publishing Group, 2010), paper WD12.

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Abstract

Residual stresses in the SiO₂ films prepared by electron beam evaporation were measured in air and nitrogen, respectively. The correlations between the stresses and coating parameters were studied in order to realize the stress control.

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