Tuning Residual Stress of Ion-beam Assisted Thin Films during annealing with Film Thickness and Substrate Temperature

Hsi-Chao Chen; Chen-Yu Huang

doi:10.1364/OIC.2010.WD10

Optical Interference Coatings
OSA Technical Digest (Optica Publishing Group, 2010),
paper WD10
•https://doi.org/10.1364/OIC.2010.WD10

Tuning Residual Stress of Ion-beam Assisted Thin Films during annealing with Film Thickness and Substrate Temperature

Hsi-Chao Chen and Chen-Yu Huang

Optical Interference Coatings 2010

Tucson, Arizona United States
6–11 June 2010
ISBN: 978-1-55752-891-9

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H. Chen and C. Huang, "Tuning Residual Stress of Ion-beam Assisted Thin Films during annealing with Film Thickness and Substrate Temperature," in Optical Interference Coatings, OSA Technical Digest (Optica Publishing Group, 2010), paper WD10.

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Abstract

The residual stress could tune from compression to tension by adding the film thickness and from tension to compression by adding the substrate temperature. During annealing the residual stress, optical properties and XRD were investigated.

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