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Large-Aperture Plasma-Assisted Deposition of ICF Laser Coatings

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Abstract

Plasma-assisted electron-beam evaporation leads to changes in the crystallinity, density, and stresses of thin films. A dual-source plasma system provides stress control of large-aperture, high-fluence coatings used in vacuum for substrates 1 m in aperture.

© 2010 Optical Society of America

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