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HfO2/SiO2 high reflectors for 1.064 μm high power laser applications

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Abstract

An optimized reactive E-beam evaporation process was used to deposit HfO2/SiO2 high reflectors for 1.064 μm high power applications. Laser induced damage threshold of the coatings was measured and possible damage mechanisms were discussed.

© 2010 Optical Society of America

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