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EUV multilayer optics at the Fraunhofer IOF

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Abstract

The accurate deposition of high reflective, laterally graded, thermal and radiation stable multilayers mirrors on super polished substrates is one of the major challenges of EUVL development today. The development of multilayer mirrors for EUVL at the Fraunhofer IOF is presented in this paper.

© 2007 Optical Society of America

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