Design of negative-dispersion mirrors for use in Ti: Sapphire femtosecond mode-locked lasers

Chunyan Liao; Jianda Shao; Zhengxiu Fan; Jianbing Huang

doi:10.1364/OIC.2004.ThA4

Optical Interference Coatings
OSA Technical Digest Series (Optica Publishing Group, 2004),
paper ThA4
•https://doi.org/10.1364/OIC.2004.ThA4

Design of negative-dispersion mirrors for use in Ti: Sapphire femtosecond mode-locked lasers

Chunyan Liao, Jianda Shao, Zhengxiu Fan, and Jianbing Huang

Optical Interference Coatings 2004

Tucson, Arizona United States
27 June–2 July 2004
ISBN: 3-5400-0364-9

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Structure and Fast Coatings (ThA)

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C. Liao, J. Shao, Z. Fan, and J. Huang, "Design of negative-dispersion mirrors for use in Ti: Sapphire femtosecond mode-locked lasers," in Optical Interference Coatings, OSA Technical Digest Series (Optica Publishing Group, 2004), paper ThA4.

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Abstract

A new negative-dispersion mirror design is reported. It exhibits high reflectivity (>99.5%) from 720 to 870 nm, high transmittance (>90%) from 510 to 550 nm and smooth group delay dispersion from 740 to 850 nm.

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