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Conferences > OIC > 2001 > ThB > ThB2

193/157 nm UV coatings for next generation photolithography – All aspects

Hans Lauth

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Abstract

The lithography market requires coated optical elements with high optical performance, minimized optical losses and a guaranteed life time. Over the last years achieved improvements were done by optimization of the whole substrate and coating manufacturing process, the development of new metrology equipment and the use of excellent analytics and test possibilities.

© 2001 Optical Society of America

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