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Conferences > OIC > 2001 > ThA > ThA1

Extreme ultraviolet coatings for the next generation lithography

C. Montcalm, J.C. Davidson, R.F. Grabner, R.M. Hudyma, B.B. Kaufmann, P.A. Kearney, M.A. Schmidt, R. Soufli, E. Spiller, C.C. Walton, and J.A. Folta

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Abstract

Extreme ultraviolet lithography is currently the leading candidate for next generation lithography. This technology requires near quarter-wave stacks Mo/Si multilayers deposited on the optical surfaces to reflect light in the 13-nm wavelength region at normal incidence.

© 2001 Optical Society of America

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