In-situ testing of high resolution optical systems via localized wavefront curvature sensing

Ryan H. Miyakawa; Christopher N. Anderson; Patrick P. Naulleau

doi:10.1364/OFT.2012.OTu2D.4

Imaging and Applied Optics Technical Papers
OSA Technical Digest (online) (Optica Publishing Group, 2012),
paper OTu2D.4
•https://doi.org/10.1364/OFT.2012.OTu2D.4

In-situ testing of high resolution optical systems via localized wavefront curvature sensing

Ryan H. Miyakawa, Christopher N. Anderson, and Patrick P. Naulleau

Optical Fabrication and Testing 2012

Monterey, California United States
24–28 June 2012
ISBN: 1-55752-947-7

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Optical Testing II (OTu2D)

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R. H. Miyakawa, C. N. Anderson, and P. P. Naulleau, "In-situ testing of high resolution optical systems via localized wavefront curvature sensing," in Imaging and Applied Optics Technical Papers, OSA Technical Digest (online) (Optica Publishing Group, 2012), paper OTu2D.4.

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Abstract

We present a new form of optical testing based on measuring localized wavefront curvature. In this method a system of pseudo-sine gratings reveal the partial second derivatives of the wavefront at specific locations, and the wavefront aberrations are reconstructed using a least squares approach.

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