Abstract

Lithography and dry etching has evolved to replace accurate crystal growth that enabled the definition of high-Q optical cavities in the past with dry etching approaches to define ultra-small mode volumes. These "printed" optical cavities can now be used to define micro- and nano-lasers in which the three-dimensional geometry is used to control the laser performance, and that can be lithographically coupled together in-plane. Advanced microcavity lasers now include photonic crystal mirrors and surface plasmon contact geometries. By combining new methods of design, fabrication and testing, it has become possible to develop higher-level abstract device design approaches that enable SPICE-like modeling of optical circuits. However, the complexity of back-reflections and the wave-like behavior of light in microfabricated geometries limits the applicability of these approaches. Here, the evolution of integrated opto-electronics into photonic crystals and plasmonics is reviewed, with an emphasis on the specific cases of miniaturized lasers, plasmonic light emitters and silicon photonics. Article not available.

© 2010 OSA, SPIE