Recent advances in subaperture stitching interferometry

Paul E. Murphy; Greg W. Forbes; Jon F. Fleig; Dragisha Miladinovic; Gary DeVries; Stephen O’Donohue

doi:10.1364/OFT.2006.OFWC2

Frontiers in Optics
OSA Technical Digest (CD) (Optica Publishing Group, 2006),
paper OFWC2
•https://doi.org/10.1364/OFT.2006.OFWC2

Recent advances in subaperture stitching interferometry

Paul E. Murphy, Greg W. Forbes, Jon F. Fleig, Dragisha Miladinovic, Gary DeVries, and Stephen O’Donohue

Optical Fabrication and Testing 2006

Rochester, New York United States
9–11 October 2006
ISBN: 1-55752-818-7

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Testing I (OFWC)

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P. E. Murphy, G. W. Forbes, J. F. Fleig, D. Miladinovic, G. DeVries, and S. O’Donohue, "Recent advances in subaperture stitching interferometry," in Frontiers in Optics, OSA Technical Digest (CD) (Optica Publishing Group, 2006), paper OFWC2.

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Abstract

It is well known that stitching can boost the aperture capability. Stitching can also improve the accuracy, lateral resolution, and testable aspheric departure. We demonstrate these improvements on our subaperture stitching interferometer (SSI^®).

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