Advanced Metrology Tools Applied for Lithography Optics Fabrication and Testing

Masaru Ohtsuka

doi:10.1364/OFT.2006.OFWC1

Frontiers in Optics
OSA Technical Digest (CD) (Optica Publishing Group, 2006),
paper OFWC1
•https://doi.org/10.1364/OFT.2006.OFWC1

Advanced Metrology Tools Applied for Lithography Optics Fabrication and Testing

Masaru Ohtsuka

Optical Fabrication and Testing 2006

Rochester, New York United States
9–11 October 2006
ISBN: 1-55752-818-7

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Testing I (OFWC)

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M. Ohtsuka, "Advanced Metrology Tools Applied for Lithography Optics Fabrication and Testing," in Frontiers in Optics, OSA Technical Digest (CD) (Optica Publishing Group, 2006), paper OFWC1.

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Abstract

Low to mid spatial frequency roughness of lens surfaces is one of key quality issues for projection optics of lithography tools. Advanced metrology instruments for this spatial frequency roughness measurement are applied to optics fabrication.

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