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Optica Publishing Group
  • Frontiers in Optics 2004/Laser Science XXII/Diffractive Optics and Micro-Optics/Optical Fabrication and Testing
  • OSA Technical Digest (CD) (Optica Publishing Group, 2004),
  • paper OTuD4
  • https://doi.org/10.1364/OFT.2004.OTuD4

Sequential interferometric techniques for measuring independent values of the refractive index and material thickness of semiconductor wafers

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Abstract

A technique is presented using both Michelson and Fabry-Perot interferometry to independently measure the refractive index and the material thickness of semiconductor wafers. The method does not require accurate prior knowledge of either quantity.

© 2004 Optical Society of America

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