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3D Electro-Optical Integration Based on High-Performance Si Photonics TSV Interposer

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Abstract

3D electro-optical integration based on a Cu-based Si-photonics TSV interposer has been demonstrated for integrated optical communication applications. The photonics TSV interposer consisting of monolithically integrated TSV, modulators and photodetectors, enabling a 30 Gbps-data-rate.

© 2016 Optical Society of America

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