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Ge Waveguide Photodetectors with Responsivity Roll-off beyond 1620 nm Using Localized Stressor

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Abstract

We report a novel Ge waveguide photodetector and the fabrication on silicon-on- insulator (SOI) platform. Localized stressor structures were incorporated to tune the responsivity roll-off wavelength. With the localized stressor structure, the roll-off in responsivity is found to be red-shifted from 1520 nm to beyond 1620 nm, i.e., a flat responsivity over the entire C- and L-band is obtained. This technique makes Ge a promising material for fabricating monolithic high- responsivity receivers covering the entire C- and L-band fiber optic communications.

© 2012 Optical Society of America

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