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Conferences > OFC > 2009 > JWA > JWA2
  • Optical Fiber Communication Conference and National Fiber Optic Engineers Conference
  • OSA Technical Digest (CD) (Optica Publishing Group, 2009),
  • paper JWA2
  • •https://doi.org/10.1364/NFOEC.2009.JWA2

Photolithography of Thick Photoresist Coating in Anisotropically Etched V-grooves for Electrically Controlled Liquid Crystal Photonic Bandgap Fiber Devices

Lei Wei, Elena Khomtchenko, Thomas Tanggaard Alkeskjold, and Anders Bjarklev

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Abstract

Thick photoresist coating for electrode patterning in anisotropically etched v-grooves is investigated. The photoresist coverage is compared with and without soft baking. Two-step exposure is applied for a complete exposure and minimizing the resolution loss.

© 2009 Optical Society of America

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