Abstract
The emergence of ultraviolet (UV)-induced fiber phase gratings in germanium-doped silica fibers1–2 has generated significant interest for many wavelength-routing applications in optical amplifiers and wavelength-division multiplexing (WDM) transmission systems. The photosensitive index changes in germanosilicate fibers resulting from exposure to ~242-nm UV light has been long established, however only in the past two years have changes been reported for phosphosilicate materials. This was first reported in hydrogen-sensitized phosphorus fiber exposed at 248 nm, where a 3 h high-fluence (500 mj/cmVpulse—30 Hz) exposure yielded a significant index modulation of ~3 × 10−4 3. Subsequently, it was reported that hydrogen-sensitized P-doped silica waveguides were similarly photosensitive when exposed to 193-nm light from an ArF source, however at a much lower integrated fluence.4 Larger index modulation gratings up to 3 × 10−3 have also been reported in P-doped silica waveguides5 and fibers,6 where in both cases the materials were sensitized with a significantly higher concentration of deuterium than previous work (3–3.5 mol%).
© 1996 Optical Society of America
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