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Optica Publishing Group
  • Conference on Optical Fiber Communication/International Conference on Integrated Optics and Optical Fiber Communication
  • 1993 OSA Technical Digest Series (Optica Publishing Group, 1993),
  • paper PD15
  • https://doi.org/10.1364/OFC.1993.PD15

Application of Phase Masks to the Photolithographic Fabrication of Bragg Gratings in Conventional Fiber/Planar Waveguides with Enhanced Photosensitivity

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Abstract

We describe a novel method for writing Bragg retro-reflectors, in photosensitive[1] (monomode) optical fiber or planar waveguide structures. The essence of the method is to use a phase mask grating to modulate spatially with pitch λBraggnEffective the phase of a UV beam (for example, from an excimer laser source); λBragg is the desired resonant wavelength for retro-reflective intra-mode coupling in the fiber and nEffective is the effective index of the fundamental mode at λBragg.

© 1993 Optical Society of America

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