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Numerically investigated the third-harmonic generation via tip-enhancement effect for high resolution near-field optical lithography

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Abstract

We proposed a new implement for high resolution near-field lithography based on the third-harmonic generation via tip enhancement. According to the time-domain finite-element analysis results, this lithographic technique could theoretically achieve 10nm-scale device line width, which is far less than that of the conventional lithography technique restricted by the diffraction limit.

© 2014 Optical Society of America

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