Nanoscale imaging interferometric lithography

A. Biswas; S. R. J. Brueck

doi:10.1364/IPR.2003.JWC5

Optics in Computing
OSA Trends in Optics and Photonics (Optica Publishing Group, 2003),
paper JWC5
•https://doi.org/10.1364/IPR.2003.JWC5

Nanoscale imaging interferometric lithography

A. Biswas and S. R. J. Brueck

Optics in Computing 2003

Washington, D.C. United States
16–20 June 2003
ISBN: 1-55752-750-4

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IPR/OC Joint Session on Nanofabrication Technologies (JWC)

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A. Biswas and S. R. J. Brueck, "Nanoscale imaging interferometric lithography," in Optics in Computing, A. Sawchuk, ed., Vol. 90 of OSA Trends in Optics and Photonics (Optica Publishing Group, 2003), paper JWC5.

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Abstract

Imaging interferometric lithography (IIL) is a spatial wavelength division multiplex approach to imaging that enables dense features ~ λ/3. Combining IIL, immersion, and nonlinear interpolation techniques, a route to features as small as 22 nm using optics is proposed.

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