Design, Fabrication and Characterization of Artificial dielectrics for polarization transformations and beam shaping applications

U. Levy; C. H. Tsai; H. C. Kim; L. Pang; Y. Fainman

doi:10.1364/NPIS.2005.NWB5

Integrated Photonics Research and Applications/Nanophotonics for Information Systems
Technical Digest (Optica Publishing Group, 2005),
paper NWB5
•https://doi.org/10.1364/NPIS.2005.NWB5

Design, Fabrication and Characterization of Artificial dielectrics for polarization transformations and beam shaping applications

U. Levy, C. H. Tsai, H. C. Kim, L. Pang, and Y. Fainman

Nanophotonics for Information Systems 2005

San Diego, California United States
13–15 April 2005
ISBN: 1-55752-787-3

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Silicon Nanophotonics (NWB)

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U. Levy, C. H. Tsai, H. C. Kim, L. Pang, and Y. Fainman, "Design, Fabrication and Characterization of Artificial dielectrics for polarization transformations and beam shaping applications," in Integrated Photonics Research and Applications/Nanophotonics for Information Systems, Technical Digest (Optica Publishing Group, 2005), paper NWB5.

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Abstract

We report the design, fabrication and characterization of artificial dielectric components for polarization transformations and beam shaping applications. The devices are realized by deep etching of subwavelength gratings with space variant orientation into a semiconductor substrate.

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