Optimization of diffractive elements for fabricating 3-D photonic crystals with interference lithography

Markus E. Testorf; Thomas J. Suleski; Yi-Chen Chuang

doi:10.1364/NANO.2006.NWA5

Integrated Photonics Research and Applications/Nanophotonics
Technical Digest (CD) (Optica Publishing Group, 2006),
paper NWA5
•https://doi.org/10.1364/NANO.2006.NWA5

Optimization of diffractive elements for fabricating 3-D photonic crystals with interference lithography

Markus E. Testorf, Thomas J. Suleski, and Yi-Chen Chuang

Nanophotonics 2006

Uncasville, Connecticut United States
26–28 April 2006
ISBN:

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Photonic Crystals I (NWA)

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M. E. Testorf, T. J. Suleski, and Y. Chuang, "Optimization of diffractive elements for fabricating 3-D photonic crystals with interference lithography," in Integrated Photonics Research and Applications/Nanophotonics, Technical Digest (CD) (Optica Publishing Group, 2006), paper NWA5.

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Abstract

The formation of intensity patterns in three dimensions is considered as a method for fabricating photonic structures. Suitable optimization algorithms are discussed for designing diffractive elements to generate the required diffraction patterns.

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