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Conferences > N3 > 2013 > NSa3A > NSa3A.15

Efficient source mask optimization with Zernike polynomial function-based source representation

Xiaofei Wu, Shiyuan Liu, Jia Li, and Edmund Y. Lam

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Abstract

This paper introduces a Zernike polynomial function-based source representation method for the aerial image calculation of optical lithography. It is shown that this representation enables computation reduction for both mask optimization and source optimization.

© 2013 Optical Society of America

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