Bi-directional top hat D-Scan for characterization of third order nonlinear waveguides

Samuel Serna; Samuel Serna; Nicolas Dubreuil

doi:10.1364/LAOP.2016.LW2A.2

Latin America Optics and Photonics Conference
(Optica Publishing Group, 2016),
paper LW2A.2
•https://doi.org/10.1364/LAOP.2016.LW2A.2

Bi-directional top hat D-Scan for characterization of third order nonlinear waveguides

Samuel Serna and Nicolas Dubreuil

Latin America Optics and Photonics Conference 2016

Medellin Colombia
22–26 August 2016
ISBN: 978-1-943580-16-3

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Nonlinear Materials and Measurement Techniques (LW2A)

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S. Serna and N. Dubreuil, "Bi-directional top hat D-Scan for characterization of third order nonlinear waveguides," in Latin America Optics and Photonics Conference, (Optica Publishing Group, 2016), paper LW2A.2.

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Abstract

The effective Kerr and two photon absorption (TPA) nonlinear parameters of a nano-waveguide are characterized by means of a bi-directional top hat D-Scan technique. This approach requires a single beam and allows the measurement of the coupling efficiencies.

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