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Diffractive Optical Element Applied To Proximity Exposure Lithography Exploring Partial Light Coherence

Giuseppe A. Cirino, Ronaldo D. Mansano, Patrick Verdonck, and Luiz G. Neto

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Abstract

A diffractive optical element has been designed to operate as lithographic photomask. An image is projected onto a silicon wafer, placed 50 µm behind the photomask and performed by exploring the partial coherence of UV source. Results show an improvement of the achieved resolution when compared with traditional amplitude photomasks.

© 2010 Optical Society of America

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